Systems and methods of etching in light source

TW202628489APending Publication Date: 2026-07-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW114133301
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-09-04
Filing Date
2025-09-01
Publication Date
2026-07-01
Patent Text Reader

Abstract

A light source includes a vessel containing a first liner, wherein the first liner has a frustum shape, an exhaust module arranged adjacent to the first liner, an etching component arranged adjacent to the exhaust module, and a gas supply coupled to the etching component. The etching component includes at least one antenna.
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