Semiconductor device manufacturing method

Abstract

A method for manufacturing a semiconductor device includes: a process for preparing a structure having a gate electrode film; a process for forming a planarization film on the structure; a process for forming a pattern on the planarization film using a photolithography process; and a process for patterning the gate electrode film using the pattern. In the process of forming the planarization film, a plurality of droplets of a curable composition are disposed on the structure, the plurality of droplets are combined to form a liquid film, and the liquid film is cured to obtain the planarization film.