Semiconductor devices and data storage systems including the same

TW202628642APending Publication Date: 2026-07-01SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
TW114127765
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-23
Filing Date
2025-07-22
Publication Date
2026-07-01
Patent Text Reader

Abstract

A semiconductor device includes: a first substrate structure including a substrate and circuit elements and a second substrate structure on the first substrate structure, wherein the second substrate structure includes gate electrodes stacked in a first direction, interlayer insulating layers alternately stacked with the gate electrodes, channel structures that extend into the gate electrodes and respectively include a channel layer and a channel dielectric layer on a side surface of the channel layer, and a source structure that is on the channel structures and includes a horizontal region and a contact region extending from the horizontal region and contacting the channel layer, where the contact region extend into a portion of the channel dielectric layer of each of the channel structures, and a lower surface of the contact region is in contact with the channel structure and the interlayer insulating layer.
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