Method for manufacturing composite substrates

TW202629000APending Publication Date: 2026-07-01NGK INSULATORS LTD
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Patent Information

Application Number
TW114141707
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-12
Filing Date
2025-10-28
Publication Date
2026-07-01
Patent Text Reader

Abstract

A method for manufacturing a composite substrate is provided, which can form a modified layer with a thickness of a predetermined value or more and can suppress the peeling of the active layer. The method for manufacturing a composite substrate according to an embodiment of the present invention includes: forming an active layer on at least one side of a crystalline support substrate; and forming a modified layer on the surface side of the support substrate by irradiating the surface of the support substrate with a pulsed laser from the active layer side; wherein the thickness of the modified layer is 10 nm or more due to the irradiation with the pulsed laser.
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