Photocatalytic material and method for manufacturing the same
TW202629304APending Publication Date: 2026-07-16MATERIAL ANALYSIS TECH INC +1
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Patent Information
- Application Number
- TW114132793
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-06
- Filing Date
- 2025-08-28
- Publication Date
- 2026-07-16
Abstract
The present invention discloses a photocatalytic material and a method for manufacturing the same. The photocatalytic material includes an inorganic semiconductor particle, an organic semiconductor layer, and an electron-transfer interfacial layer. The inorganic semiconductor particle is composed of a metal oxide semiconductor material. The organic semiconductor layer is formed from an organic conjugated polymer and is disposed to surround the outer surface of the inorganic semiconductor particle. The electron-transfer interfacial layer includes a noble metal dispersed in the form of single atoms or nanoclusters on the surface of the inorganic semiconductor particle, and is positioned between the inorganic semiconductor particle and the organic semiconductor layer to form electron transport pathways.
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