Graphic Formation Method

TW202629619APending Publication Date: 2026-07-16NISSAN CHEM CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
NISSAN CHEM CORP
Filing Date
2022-12-08
Publication Date
2026-07-16
Patent Text Reader

Abstract

A resistive underlayer film, which is a sintered product of a coating film as a composition for forming a resistive underlayer film, wherein the composition for forming a resistive underlayer film contains a polymer having at least one unit structure having a unit structure (A) having a polycyclic aromatic hydrocarbon structure and a unit structure (B) derived from a maleicimine structure, and the thickness of the resistive underlayer film is less than 10 nm.
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