Semiconductor processing components and processing methods

TW202629752APending Publication Date: 2026-07-16JSR CORPORATION
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
JSR CORPORATION
Filing Date
2025-12-18
Publication Date
2026-07-16

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Abstract

The present invention aims to provide a semiconductor processing composition and a processing method thereon, wherein the semiconductor processing composition exhibits excellent storage stability and can effectively reduce corrosion or defects in the wiring material on the surface of the object being processed. The semiconductor processing composition of the present invention contains (A) a heterocyclic compound, (B) at least one compound selected from the group consisting of quaternary ammonium salts, quaternary phosphonium salts, and tertiary strontium salts, and (C) a liquid medium, wherein when the content of component (A) is set as MA [parts by mass] and the content of component (B) is set as MB [parts by mass], MA / MB = 0.1 to 1000, and the pH is 2 to 9.
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