Semiconductor processing components and processing methods
TW202629752APending Publication Date: 2026-07-16JSR CORPORATION
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- JSR CORPORATION
- Filing Date
- 2025-12-18
- Publication Date
- 2026-07-16
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Abstract
The present invention aims to provide a semiconductor processing composition and a processing method thereon, wherein the semiconductor processing composition exhibits excellent storage stability and can effectively reduce corrosion or defects in the wiring material on the surface of the object being processed. The semiconductor processing composition of the present invention contains (A) a heterocyclic compound, (B) at least one compound selected from the group consisting of quaternary ammonium salts, quaternary phosphonium salts, and tertiary strontium salts, and (C) a liquid medium, wherein when the content of component (A) is set as MA [parts by mass] and the content of component (B) is set as MB [parts by mass], MA / MB = 0.1 to 1000, and the pH is 2 to 9.
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