Thin film processing method and method for manufacturing memory devices including the thin film.

TW202629762APending Publication Date: 2026-07-16SOUTH KOREAN BUSINESS EGTM CO LTD

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Patent Information

Application Number: TW115101306
Authority / Receiving Office: TW · TW
Patent Type: Applications
Current Assignee / Owner
Priority Date: 2026-01-07
Filing Date: 2026-01-13
Publication Date: 2026-07-16

Application Information

Patent Timeline

07 Jan 2026

Priority

13 Jan 2026

Application

TW115101306

16 Jul 2026

Publication

TW202629762A

IPC: C09K13/00; C23F1/12; H10P50/26; H10P50/28; H10P70/00

Inventors: 曹圭鎬; 金明鎰

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Abstract

According to one embodiment of the present invention, the thin film processing method includes the steps of supplying a surface modifier to the interior of a cavity in which a substrate on which a thin film is formed is placed; purging the interior of the cavity; supplying an etchant to the interior of the cavity; and purging the interior of the cavity.

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