Reflectors, chamber arrangements, and material layer deposition methods

TW202629817APending Publication Date: 2026-07-16ASM IP HLDG BV
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Patent Information

Application Number
TW114137113
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-01
Filing Date
2025-09-26
Publication Date
2026-07-16
Patent Text Reader

Abstract

A reflector includes a body with a first surface having a first aperture and a second surface with a reflective material and a second aperture, separated by the body’s thickness. The apertures are fluidly coupled by a channel extending through the body, with one aperture positioned closer to the side than the other. The channel is angled to issue coolant from the second aperture at an oblique flow angle relative to the reflector body. Chamber arrangements, semiconductor processing systems, and material layer deposition methods using the reflector are also described.
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