A semiconductor manufacturing apparatus and a method for manufacturing of a semiconductor

TW202629820APending Publication Date: 2026-07-16ASM IP HLDG BV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ASM IP HLDG BV
Filing Date
2025-09-23
Publication Date
2026-07-16

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Abstract

An apparatus and method is disclosed. The apparatus having: a reaction chamber; one or more gas inlets connected to said reaction chamber to provide precursor gas into said reaction chamber; and; an accumulator connected to at least one of said one or more gas inlets. The apparatus having three evaporators / condensers, a first evaporator / condenser connectable with the accumulator and constructed to be heated to provide sublimated / evaporated precursor to the reaction chamber via the accumulator; a second evaporator / condenser connectable to a bulk precursor storage constructed to be cooled to deposit precursor from the heated storage in it; and a third evaporator / condenser connectable between an exhaust of the reaction chamber and a pump and to be constructed to be cooled to deposit precursor from the exhaust before it reaches the pump.
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