Systems, methods, and software for model-based focus and dose metrology with stack monitoring

Abstract

Disclosed is a method of determining focus or dose (f / d) conditions in a lithography process. The method can include obtaining first measurement signals and second measurement signals generated by using an optical metrology sensor to measure a set of f / d marks that are processed in the lithography process. Modeled values of stack parameters of the set of f / d marks can be determined based on the first measurement signals and a sensor model, where the sensor model is configured to simulate an interaction between a measurement sensor and a f / d mark. An f / d value in the lithography process can be determined based on applying the sensor model utilizing the second measurement signals and the modeled values of the stack parameters.