Method to align a substrate for lithography and system performing the same, and machine-readable medium embodying instructions

Abstract

A photolithography machine with an alignment system is described. The photolithography machine can identify a fiducial pattern provided on a substrate and use the location of the fiducial pattern to align the substrate before exposure. The fiducial pattern can include a plurality of fiducial markings arranged in a specified pattern. A model matching technique can be applied to match the respective individual fiducial markings. A shaping technique can then be used to identify the fiducial pattern based on the matched fiducial markings.