Semiconductor device and methods of forming the same

TW202630656APending Publication Date: 2026-07-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Application Number
TW114107302
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-09
Filing Date
2025-02-27
Publication Date
2026-07-16
Patent Text Reader

Abstract

A pixel sensor includes a first source-follower gate and a second-follower gate respectively connected to a photodiode and to an overflow capacitor such that the first source-follower gate may read a voltage of the photodiode, while the second source-follower gate simultaneously reads a voltage of the overflow capacitor. The arrangement including the first and second source-follower gates permits the photodiode and overflow capacitor voltages to be read at the same time, so that the time to read the photodiode and overflow capacitor voltages (e.g., read-out speed) is equal to the time during which the photodiode and overflow capacitor voltages are simultaneously read. The simultaneous reading of photodiode and overflow capacitor voltages increases an image sensor device frame rate in comparison to when the photodiode and overflow capacitor voltages are read in sequence, thereby increasing the rate at which an image sensor device captures images, and improving image sensor device performance.
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