Semiconductor structure and method for manufacturing the same

TW202630740AInactive Publication Date: 2026-07-16MACRONIX INTERNATIONAL CO LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
MACRONIX INTERNATIONAL CO LTD
Filing Date
2025-02-04
Publication Date
2026-07-16
Estimated Expiration
Not applicable · inactive patent

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Abstract

A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure includes a staircase structure comprising conductive layers and insulating layers stacked alternately, a conductive pillar on the staircase structure and an insulating structure penetrating the staircase structure and connected to the conductive pillar.
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