Integrated circuit and method for forming the same

TW202630809APending Publication Date: 2026-07-16TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD +1
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Patent Information

Application Number
TW114120393
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-10
Filing Date
2025-05-29
Publication Date
2026-07-16
Patent Text Reader

Abstract

A memory unit includes a first IO-functional circuit and a second IO-functional circuit separated by a padding area. Each of the first IO-functional circuit and the second IO-functional circuit is associated with an array of bit-cells. The first IO-functional circuit has transistors in a first group of first-type active-region structures and in a first group of second-type active-region structures. The second IO-functional circuit has transistors in a second group of first-type active-region structures and in a second group of second-type active-region structures. The padding area includes a third group of first-type active-region structures which is adjacent to the first group of first-type active-region structures and adjacent to the second group of first-type active-region structures.
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