Substrate support and substrate processing system including the same

TW202630901APending Publication Date: 2026-07-16LAM RES CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
LAM RES CORP
Filing Date
2021-03-30
Publication Date
2026-07-16

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Abstract

A substrate support for a substrate processing chamber includes a baseplate, an edge ring arranged on the baseplate, a seal arrangement located between the edge ring and the baseplate that is configured to define an interface between the edge ring and the baseplate, and at least one channel in fluid communication with the interface and configured to supply a heat transfer gas to the interface.
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