Systems and methods for monitoring cleanliness of a substrate processing chamber

Abstract

Methods and apparatus for monitoring cleanliness of a substrate processing chamber are provided herein. In some embodiments, the method includes illuminating a surface of a component of the substrate processing chamber, the component surrounded by a chamber enclosure that is sealed from external light, the surface being illuminated by UV light generated from within a volume between the component and the enclosure; capturing an image of the illuminated surface; analyzing the captured image; determining based on the analyzing whether chamber cleaning is needed; and when it is determined that chamber cleaning is needed, generating an alert indicating that chamber cleaning is needed.

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