Degassing apparatus and substrate processing apparatus equipped with the same, as well as degassing method and liquid supply method

TW202630923APending Publication Date: 2026-07-16SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
TW114129505
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-09-24
Filing Date
2025-08-04
Publication Date
2026-07-16
Patent Text Reader

Abstract

The degassing apparatus 6a of the present invention includes: a tank 11 for storing the liquid to be degassed; a circulation pipe 19 connected at one end to the outlet 106 of the tank 11 and at the other end to the inlet 105 of the tank 11; a pump 15 disposed in the circulation pipe 19 for drawing liquid from the tank 11 and outputting it; and a foamer 13 disposed in the circulation pipe 19 for generating bubbles from the liquid by allowing the liquid to flow through a narrowed section of the flow path cross-section; and degassing the liquid stored in the tank 11 is performed by circulating the liquid between the tank 11 and the foamer 13.
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