Raised split-ring resonator plasma source

TW202633016APending Publication Date: 2026-08-01INFKON
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Patent Information

Application Number
TW114137843
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-04
Filing Date
2025-10-01
Publication Date
2026-08-01

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Abstract

A plasma generating device for generating a plasma inside of a chamber includes a base extending along a ground plane. The device further includes a conductive resonator defining a gap and connected to an energy supply, where the gap comprises a width. The device includes at least one support that includes a first end structured to engage the base and an opposing second end structured to support the conductive resonator a distance away from the base. The conductive resonator is structured to generate the plasma at or near the gap and above the base.
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