Methods and apparatus for thermal processing of materials
The photonics processing apparatus addresses non-uniform heat treatment by adjusting illumination parameters and thermal feedback to achieve uniform heating across larger areas, overcoming preheating challenges in pulsed flash lamp systems.
Patent Information
- Application Number
- TW114139115
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-10-09
- Filing Date
- 2025-10-09
- Publication Date
- 2026-08-01
AI Technical Summary
Existing heat treatment systems using pulsed flash lamps face challenges in achieving uniform heat treatment of materials due to preheating effects from thermally conductive materials, leading to non-uniform heating of upstream regions.
A photonics processing apparatus and method that adjusts illumination pulses based on time-heating characteristics and thermal feedback to compensate for preheating, using a control system to modify illumination parameters such as intensity, duration, and movement speed to ensure uniform heat treatment across larger areas.
The system achieves substantially uniform heat treatment by compensating for preheating, ensuring consistent thermal processing of materials despite variations in thermal conductivity and material composition.