Delivery method for vacuum pump

TW202633804APending Publication Date: 2026-08-16TSMC CHINA COMPANY +1
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Patent Information

Application Number
TW114118562
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-07
Filing Date
2025-05-16
Publication Date
2026-08-16

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Patent Text Reader

Abstract

A method includes receiving a demand for delivering a vacuum pump in a wafer fabrication facility. The vacuum pump in a pump storage region of the wafer fabrication facility is assigned. A pump delivery tool is set up on a top surface of the assigned vacuum pump. The pump delivery tool includes length adjustment mechanisms, width adjustment mechanisms, and first fixing elements. The width adjustment mechanisms and the length adjustment mechanisms are over the top surface of the assigned vacuum pump. The width adjustment mechanisms are assembled to the length adjustment mechanisms. The width adjustment mechanisms are substantially perpendicular to the length adjustment mechanisms. The first fixing elements secure the length adjustment mechanisms to the width adjustment mechanisms. The assigned vacuum pump is delivered by using the pump delivery tool in the wafer fabrication facility.
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