Radiosensitive linear components, patterning methods and compounds

Abstract

The present invention aims to provide a radiosensitive linear composition, a patterning method, and a compound that, during resist patterning, can fully exert its sensitivity, exposure margin, depth of focus, pattern rectangularity, storage stability, development defect performance, CDU, and pattern circularity. The radiosensitive linear composition comprises: a polymer (A), a compound (B) represented by the following formula (1), an acid diffusion control agent (C), and a solvent (S). (In formula (1), Q is a quinone structure. M+ is a monovalent organic cation.)