Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process

TW202633873APending Publication Date: 2026-08-16SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW114135423
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-07
Filing Date
2025-09-16
Publication Date
2026-08-16

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Abstract

are a sulfonium salt monomer having the formula (A), a polymer comprising repeat units derived from the sulfonium salt monomer, a chemically amplified resist composition containing the polymer, a pattern forming process using the chemically amplified resist composition. Herein, Z- is an aromatic sulfonate anion having a polymerizable group.
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