Sulfonium salt, chemically amplified resist composition, and pattern forming process

TW202633874AActive Publication Date: 2026-08-16SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW114135441
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-07
Filing Date
2025-09-16
Publication Date
2026-08-16
Estimated Expiration
2045-09-15

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Abstract

a chemically amplified resist composition containing the sulfonium salt as a quencher, and a pattern forming process using the chemically amplified resist composition. In the formula, Z- is an aromatic carboxylate anion which may have a substituent.
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