Acid generating agent, resist composition and resist pattern manufacturing method and salt

Abstract

The object of this invention is to provide an acid generator and a resist composition capable of producing resist patterns with good CD uniformity. An acid generator contains a salt represented by formula (I). [In the formula, Q1, Q2, R1, and R2 represent hydrogen atoms, fluorine atoms, etc., respectively; z represents an integer from 0 to 6; X1 represents a single bond, -O-, -CO-, etc.; mm1 represents 0 or 1; L1 represents a single bond or a substituted / unsubstituted hydrocarbon group; W0 represents a single bond or a substituted / unsubstituted cyclic hydrocarbon group; A01 represents a single bond or a substituted / unsubstituted hydrocarbon group; W1 represents a substituted / unsubstituted cyclic hydrocarbon group; X11 represents -O-, -CO-, -S-, etc., or a group formed by combining these; R11 represents a substituted / unsubstituted hydrocarbon group, in W1, -X11-R11 is bonded to the carbon atom adjacent to the carbon atom bonded to -A01-; R3 represents a hydrogen atom or an acid-unstable group; R4 represents a halogen atom, cyano group, etc.; m4 represents an integer from 0 to 4; mm2 represents an integer from 1 to 5; Z+ represents an organic cation.]