Photosensitive resin composition, photosensitive resin film, printed circuit board and manufacturing method thereof, and semiconductor package
TW202633926APending Publication Date: 2026-08-16RESONAC CORP
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Patent Information
- Application Number
- TW114149062
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-26
- Filing Date
- 2025-12-15
- Publication Date
- 2026-08-16
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Figure TWG2TA001073242_001 
Figure TWG2TA001073242_002
Abstract
A photosensitive resin composition, a photosensitive resin film using the photosensitive resin composition, a printed circuit board and a method for manufacturing the same, and a semiconductor package, wherein the photosensitive resin composition comprises: (A) a photopolymerizable compound having an ethylene unsaturated group and an acidic substituent; (B) one or more selected from the group consisting of a silane coupling agent having (meth)acrylic and alkoxysilyl groups and components derived from the silane coupling agent; (C) a thermosetting resin; and (D) an organic peroxide; wherein the aforementioned (C) thermosetting resin comprises one or more selected from the group consisting of maleimide resin and allyl resin. none
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