Ethylene copolymers, their manufacturing methods, and cleaning agents for semiconductor components
TW202633939APending Publication Date: 2026-08-16TOAGOSEI CO LTD
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Patent Information
- Application Number
- TW114140256
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-10-21
- Filing Date
- 2025-10-17
- Publication Date
- 2026-08-16
Abstract
Ethylene copolymers comprise building units (A) and building units (B). Building unit (A) originates from an ethylene monomer (A) having an acidic functional group and lacking an ester bond, while building unit (B) originates from an ethylene monomer (B) lacking both an acidic functional group and an ester bond. Ethylene copolymers are obtained, for example, by polymerizing a plurality of ethylene monomers, including ethylene monomer (A) and ethylene monomer (B), using a living radical polymerization method.
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