Resin composition, cured material, transfer film, multilayer, manufacturing method of cured material, manufacturing method of multilayer, manufacturing method of semiconductor device, and semiconductor device.
TW202633965APending Publication Date: 2026-08-16FUJIFILM CORP
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Patent Information
- Application Number
- TW114147661
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-06
- Filing Date
- 2025-12-05
- Publication Date
- 2026-08-16
Abstract
A resin composition comprising a resin (A) which is at least one of a polyimide precursor and a polyimide, wherein the resin (A) has a structure represented by formula (1-1) and a structure represented by formula (1-2) as described in the specification, and the content of the structure represented by formula (1-2) in the resin (A) is 0.001 mmol / g or more and 0.10 mmol / g or less.
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