Resin composition, cured material, transfer film, multilayer, manufacturing method of cured material, manufacturing method of multilayer, manufacturing method of semiconductor device, and semiconductor device.

TW202633965APending Publication Date: 2026-08-16FUJIFILM CORP
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Patent Information

Application Number
TW114147661
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-06
Filing Date
2025-12-05
Publication Date
2026-08-16
Patent Text Reader

Abstract

A resin composition comprising a resin (A) which is at least one of a polyimide precursor and a polyimide, wherein the resin (A) has a structure represented by formula (1-1) and a structure represented by formula (1-2) as described in the specification, and the content of the structure represented by formula (1-2) in the resin (A) is 0.001 mmol / g or more and 0.10 mmol / g or less.
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