Semiconductor processing assembly and method of cleaning a reaction chamber of a semiconductor processing assembly

TW202634046APending Publication Date: 2026-08-16ASM IP HLDG BV
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Patent Information

Application Number
TW115116759
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-11-24
Filing Date
2022-11-17
Publication Date
2026-08-16

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Abstract

The current disclosure relates to a semiconductor processing assembly for etching material from a surface of a substrate. The assembly includes: at least one reaction chamber for etching constructed and arranged to hold a substrate; an injector system constructed and arranged to provide a haloalkylamine into the at least one reaction chamber in a vapor phase; and a first reactant vessel constructed and arranged to contain the haloalkylamine,wherein the assembly is constructed and arranged to provide the haloalkylamine via the injector system into the at least one reaction chamber for etching the material from the substrate.
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