Copper materials and insulating substrates

TW202634080APending Publication Date: 2026-08-16MITSUBISHI MATERIALS CORP
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Patent Information

Application Number
TW114142395
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-01
Filing Date
2025-10-31
Publication Date
2026-08-16

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Abstract

The Cu content is set to be 99.9% or higher, the conductivity to be 95% IACS or higher, and in a cross-section orthogonal to the plate thickness direction, when the crystal orientation distribution function obtained by texture analysis by EBSD is expressed in Euler angles (φ1, Φ, φ2), the average value of the orientation density is 3.0 or higher in φ1: 30~45°, Φ: 40~50°, and φ2: 0°, and the average value of the orientation density is 1.4 or lower in φ1: 20~35°, Φ: 90°, and φ2: 45°.
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