Substrate processing apparatus and method

Abstract

A matrix processing apparatus (100) and a method are disclosed. The matrix processing apparatus includes: a reaction chamber (110) for receiving one or more matrices (120) for processing, wherein the reaction chamber wall includes a first wall (W1), a second wall (W2) positioned opposite the first wall (W1), and one or more sidewalls connecting the first wall (W1) and the second wall (W2); an injection manifold (130) attached to the first wall (W1) to feed a precursor stream (Fp) into the reaction chamber (110) through one inlet opening (160) in the first wall (W1); and two outlets, a first outlet (150a) and a second outlet (150b), the two outlets being configured to at least one of the one or more sidewalls (SW1, SW2, SW3, SW4) to remove fluid from the reaction chamber (110). A substrate processing apparatus (100) and a method, comprising a reaction chamber (110) for accommodating one or more substrates (120) for processing, wherein the reaction chamber walls comprise a first wall (W1), second wall W2 located opposite to the first wall (W1), and one or more side walls connecting the first wall (W1) and the second wall (W2), an injection manifold (130) attached to the first wall (W1) to feed precursor flow (Fp) to the reaction chamber (110) through an entrance opening (160) in the first wall (W1), and two exhaust ports, a first exhaust port (150a) and a second exhaust port (150b), arranged to at least one of the one or more the side walls (SW1, SW2, SW3, SW4) to remove fluid from the reaction chamber (110).

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