Process chamber improvement

Abstract

A process chamber is provided including: a chamber body disposed around an interior volume; a substrate support in the interior volume, the substrate support having a substrate supporting surface; a gas delivery assembly positioned over the substrate support. A central vertical axis extends through the gas delivery assembly and through a center of the substrate support, and the substrate support includes an inner portion and an outer portion, the outer portion located further from the central vertical axis than the inner portion is to the central vertical axis. The process chamber further includes an electrode in the substrate support, the electrode located in the outer portion of the substrate support without extending into the inner portion of the substrate support.

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