Pretreatment method for epitaxial pre-cleaning chambers

Abstract

This invention discloses a pretreatment method for an epitaxial pre-cleaning chamber, comprising: providing an epitaxial pre-cleaning chamber; and homogenization treatment: introducing a first pretreatment gas and a second pretreatment gas into the chamber respectively, so that the complex formed by the reaction of the first pretreatment gas and the second pretreatment gas is adsorbed on the inner wall surface of the chamber to provide a stable chemical environment; wherein, the first pretreatment gas contains NH3, and the second pretreatment gas contains F-containing active particles. This invention homogenizes the chamber before substrate cleaning, ensuring that the adsorption of process gases in the chamber is in a dynamic equilibrium state. During the etching and cleaning process, the chamber can maintain long-term chemical stability without affecting the concentration or distribution of the process gases, enabling continuous cleaning of multiple batches of substrates with good consistency.

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