Substrate processing system and adjustment method

Abstract

The substrate processing system disclosed in this invention includes a process module, a transport module, a distance measurement module, and a control unit. The distance measurement module includes a plurality of light input / output units and processing circuitry. The control unit is configured to perform a light intensity adjustment operation. The light intensity adjustment operation includes the following steps: (a) moving the aforementioned end effector above a reference object; (b) irradiating the reference object with measurement light from each of the plurality of light input / output units, and receiving reflected light from the reference object from each of the plurality of light input / output units; and (c) when it is determined that the light intensity of the reflected light obtained during the light reception period of the distance measurement module is below a threshold or does not reach the threshold, adjusting at least one of the transport module and the distance measurement module to increase the light intensity.

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