Reflective blank photomask, reflective photomask, and manufacturing method of reflective photomask

Abstract

The purpose of this disclosure is to provide a reflective blank photomask, a reflective photomask, and a method for manufacturing the same, which reduces the adhesion of foreign matter to the surface of the back conductive film that may occur during the mask manufacturing process. The reflective blank photomask 100, related to an embodiment of this disclosure, is a reflective blank photomask used for pattern transfer using extreme ultraviolet light as a light source. It includes: a substrate 11; a reflective portion 12 formed on the substrate 11 and reflecting incident light; a low-reflectivity portion 13 formed on the reflective portion 12 with or without other films separating it; and a back conductive film 14 formed on the side of the substrate 11 opposite to the side where the reflective portion 12 is formed. The surface free energy of the back conductive film 14 is 0.8 or less when the surface free energy of amorphous TaN is 1.

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