Method and apparatus for depicting charged particle beams

Abstract

This invention provides a charged particle beam mapping method and apparatus that can reduce the increase in mapping time in multiple mapping even when multiple wafers with different precisions are present. One aspect of the charged particle beam mapping method of this invention is a method for mapping multiple patterns assigned to any one of multiple pattern groups as the mapping object, comprising the following steps: setting the multiple mapping multiplicity for each pattern group of the multiple pattern groups to a value that is different from that of the pattern groups; and mapping the multiple patterns on the sample using a charged particle beam according to the multiplicity set for each pattern group by performing the following processes: mapping each pattern of two or more pattern groups of the multiple pattern groups in each movement of the stage holding the sample in a predetermined direction; and mapping the remaining pattern groups of two or more pattern groups without mapping at least one pattern group fewer than two or more pattern groups in each movement of the stage in the predetermined direction.

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