Apparatus for photoresist dry deposition

TW202634361APending Publication Date: 2026-08-16LAM RES CORP
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Patent Information

Application Number
TW115117318
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2019-06-27
Filing Date
2020-06-24
Publication Date
2026-08-16

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Abstract

Systems and techniques for dry deposition of extreme ultraviolet-sensitive (EUV-sensitive) photoresist layers are discussed. In some such systems, a processing chamber may be provided that features a multi-plenum showerhead that is configured to receive a vaporized organometallic precursor in one plenum and a vaporized counter-reactant thereof in another plenum. The two vaporized reactants may be delivered to a reaction space within the processing chamber and over a wafer support that supports the substrate.
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