Detection of tin spitting

TW202634365APending Publication Date: 2026-08-16ASML NETHERLANDS BV +1
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Patent Information

Application Number
TW114138728
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-25
Filing Date
2025-10-08
Publication Date
2026-08-16

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Abstract

A measuring system for determining a property of one or more contaminants on a component related to a lithographic process, the measuring system comprising a first mass sensor comprising a first sensing face and configured to provide a first signal indicating increases and decreases in mass on the first sensing face. The measuring system further comprises a second mass sensor comprising a second sensing face and configured to provide a second signal indicating increases and decreases in mass on the second sensing face and a controller. The controller is configured to, in use: receive, from the first mass sensor, the first signal, receive, from the second mass sensor, the second signal, and determine, based on the first and second signals, the property of the contaminant.
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