Controlling contamination by target material in an EUV radiation source

TW202634372APending Publication Date: 2026-08-16ASML NETHERLANDS BV
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Patent Information

Application Number
TW114148588
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-11-03
Filing Date
2025-12-11
Publication Date
2026-08-16

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Abstract

Disclosed are systems and methods for producing extreme ultraviolet (EUV) radiation from a target material in a source vessel in which gas flows carry stray target material vapor and in which measures are adopted to reduce the amount of stray target material that is able to escape the source vessel and reach downstream modules and components.
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