EUV-driven laser for generating a plasma state that emits an EUV beam, apparatus for exposing a photosensitive coating, applications of the EUV-driven laser, methods for generating a plasma state that emits an EUV beam, and methods for exposing a photosensitive coating.

Abstract

An EUV-driven laser (10) for generating a plasma state of an EUV beam (18) emitting an EUV beam from a target (68) comprises: a plurality of laser beam sources (22) for generating a plurality of laser beams (24); a combining device (62) for combining the plurality of laser beams (24) into an excitation beam (64) to generate the plasma state; and a focusing device (66) for focusing the excitation beam (64) onto the target (68) to generate the plasma state. Each laser beam source (22) has a mirror (26), an output coupling mirror (28), a laser-active medium (30) disposed between the mirror (26) and the output coupling mirror (28), and a photonic structure (34) designed to determine at least one beam parameter of the laser beam (24). The mirror (26) faces a first wide side (38) of the laser-active medium (30). The output coupling mirror (28) is oriented toward the second wide side (40) of the laser active medium (30).

Images