Artificial intelligence-based bias prediction for run-to-run process control
TW202634378APending Publication Date: 2026-08-16APPLIED MATERIALS INC
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114140650
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-27
- Filing Date
- 2025-10-21
- Publication Date
- 2026-08-16
Smart Images

Figure TWG2TA001072803_001 
Figure TWG2TA001072803_002 
Figure TWG2TA001072803_003
Abstract
Methods and systems for artificial intelligence (AI)-based bias prediction for run-to-run (R2R) process control are provided. A process recipe and a target outcome of a substrate process to be performed using one or more manufacturing equipment are identified. The process recipe and the target outcome are provided as an input to a machine learning model trained to predict biases of current substrate processes performed using manufacturing equipment in view of prior substrate processes performed using the manufacturing equipment. One or more outputs of the machine learning model are obtained, where the one or more outputs include a bias of the substrate process in view of one or more prior substrate processes performed using the manufacturing equipment. One or more settings of the process recipe are updated based on the bias.
Need to check novelty before this filing date? Find Prior Art