Method of monitoring states of a plurality of processing cycles in a process chamber
TW202634382APending Publication Date: 2026-08-16AETHER INC
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Patent Information
- Application Number
- TW115117321
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-20
- Filing Date
- 2024-12-30
- Publication Date
- 2026-08-16
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Abstract
The present disclosure discloses a method of monitoring states of a plurality of processing cycles in a process chamber. The method include: obtaining a reference S parameter data set from the process chamber prepared in a reference state; obtaining a plurality of S parameter data sets from the process chamber during a reference processing cycle and comparing the plurality of S parameter data sets with the reference S parameter data set to calculate a plurality of reference similarity values and plotting the plurality of reference similarity values to generate a reference similarity graph; obtaining a plurality of first S parameter data sets from the process chamber during a first processing cycle and comparing the plurality of first S parameter data sets with the reference S parameter data set to calculate a plurality of first similarity values and plotting the plurality of first similarity values to generate a first similarity graph; comparing the first similarity graph with the reference similarity graph to generate a first comparing result; and determining whether the state of the first processing cycle is normal or abnormal based on the first comparing result.
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