Method of detecting a process abnormality, non-transitory computer-readable recording medium and apparatus for processing a substrate

Abstract

An exemplary embodiment of the present invention provides a method of detecting a process abnormality, the method including: deriving reference data from a plurality of sample data, and comparing the derived reference data with determination target data to detect an abnormality in a process performed while the determination target data is collected, in which the sample data and the determination target data are data collected while a process of processing a substrate is performed, the reference data includes: a first reference band, which is a threshold range at a first data point; and a second reference band, which is a threshold range at a second data point, in which the second data point is a point having a measurement value acquisition time point different from the first data point, and the first reference band and the second reference band have different sizes.

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