Plasma processing based on bias supply reporting

TW202634653APending Publication Date: 2026-08-16AES GLOBAL HLDG PTE LTD
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Patent Information

Application Number
TW114144341
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-13
Filing Date
2025-11-13
Publication Date
2026-08-16

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Abstract

A generator to provide a source waveform, and a controller configured to receive a signal indicative of power reflected to the generator, receive timing information from a bias supply, and provide a report of the impedance based upon the bias waveform information.
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