Ion implanter system
TW202634654APending Publication Date: 2026-08-16APPLIED MATERIALS INC
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Patent Information
- Application Number
- TW114137956
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-06
- Filing Date
- 2025-10-01
- Publication Date
- 2026-08-16
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Figure TWG2TA001072670_001 
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Abstract
An ion implanter is disclosed. The ion implanter generates a vertically oriented ion beam that is used to impact a workpiece. The vertically oriented ion beam may be a spot beam that is directed toward the workpiece. The workpiece is mounted on a hollow workpiece holder. The hollow workpiece holder is attached to a workpiece motion system, which is capable of moving the hollow workpiece holder in at least two directions such that the entirety of the workpiece may be impacted by the stationary spot ion beam. In some embodiments, the workpiece motion system may support a plurality of workpieces.
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