Ion implanter and method of operating ion implanter

Abstract

An ion implanter. The ion implanter may include an ion source to generate a continuous ion beam, and a linear accelerator to receive generate a bunched ion beam from the continuous ion beam, and accelerate the bunched ion beam. The linear accelerator may include a plurality of acceleration stages, arranged to accelerate the bunched ion beam to a plurality of energy levels, respectively, and a beam energy measurement system, arranged to measure a beam energy of the bunched ion beam, after exiting at least one of the plurality of acceleration stages. As such, the beam energy measurement system may include a fingerprint signal generation circuit, to impart a fingerprint signal into an RF signal to an acceleration stage of the linear accelerator, and a fingerprint detection circuit, disposed downstream of the acceleration stage, and arranged to detect the fingerprint signal.

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