Semiconductor processing equipment and its DC voltage signal control system

Abstract

This invention provides a semiconductor processing apparatus and its DC voltage signal control system. In this system, a first signal generation module and a second signal generation module are controlled to operate independently and their on / off states are mutually exclusive. They acquire DC power to generate a first DC voltage signal and a second DC voltage signal that do not overlap in the time domain. These signals are provided to the semiconductor processing apparatus to form a bias voltage, controlling the acceleration process of charged particles in the plasma. This invention simplifies the system structure, achieves fast-response switching control, prevents short circuits, improves the safety and stability of system operation, enhances the flexibility of signal modulation, allows for targeted optimization of pulse waveforms, and improves the process performance of semiconductor processing.

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