Plasma status monitoring using an artificial intelligence model

TW202634662APending Publication Date: 2026-08-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW114141383
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-04-29
Filing Date
2025-10-27
Publication Date
2026-08-16

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Abstract

A system comprising a memory device and a processing device, operatively coupled with the memory device, to perform operations. The processing device receives a measured output of a sensor, wherein the measured output corresponds to a plasma signal from a processing chamber. The processing device filters the measured output of the sensor to obtain a filtered output. The processing device compares the filtered output with an expected output to determine an error value associated with the filtered output, wherein the expected output is generated using a first artificial intelligence (AI) model. The processing device determines whether the error value satisfies an error threshold criterion. The processing device identifies, based on whether the error value satisfies the error threshold criterion, a transition.
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