Plasma status monitoring using an artificial intelligence model
TW202634662APending Publication Date: 2026-08-16APPLIED MATERIALS INC
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Patent Information
- Application Number
- TW114141383
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-04-29
- Filing Date
- 2025-10-27
- Publication Date
- 2026-08-16
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Abstract
A system comprising a memory device and a processing device, operatively coupled with the memory device, to perform operations. The processing device receives a measured output of a sensor, wherein the measured output corresponds to a plasma signal from a processing chamber. The processing device filters the measured output of the sensor to obtain a filtered output. The processing device compares the filtered output with an expected output to determine an error value associated with the filtered output, wherein the expected output is generated using a first artificial intelligence (AI) model. The processing device determines whether the error value satisfies an error threshold criterion. The processing device identifies, based on whether the error value satisfies the error threshold criterion, a transition.
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