Plasma treatment equipment and heating method for moving shielding ring

Abstract

A plasma treatment device and a method for heating a moving shielding ring are disclosed. The plasma treatment device has an upper electrode assembly for introducing reactive gases and a lower electrode assembly for supporting a substrate within its treatment chamber, forming a plasma treatment area. The upper electrode assembly includes a heater and a grounding ring. A moving shielding ring rises to a first position within the treatment chamber, exposing the substrate inlet / outlet. The upper side of the moving shielding ring surrounds the grounding ring, and the heat from the grounding ring heats the moving shielding ring through thermal radiation. The moving shielding ring then descends to a second position within the treatment chamber, surrounding the plasma treatment area, where the heat generated by the plasma heats the moving shielding ring through thermal radiation. Throughout the entire process, the moving shielding ring is constantly heated by thermal radiation, maintaining a high temperature to prevent polymer deposition and adsorption from the process reaction, thus reducing particulate contamination and improving product yield.

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