System and method for defining, detecting or characterizing event in plasma processing system and relevant computer readable storage medium

TW202634667APending Publication Date: 2026-08-16AES GLOBAL HLDG PTE LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115112669
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-05-12
Filing Date
2021-05-12
Publication Date
2026-08-16

Smart Images

  • Figure TWG2TA001073521_001
    Figure TWG2TA001073521_001
  • Figure TWG2TA001073521_002
    Figure TWG2TA001073521_002
  • Figure TWG2TA001073521_003
    Figure TWG2TA001073521_003
Patent Text Reader

Abstract

A system, method and software for generating and receiving information about the AC, DC, RF, voltage, and other characteristics and information provided by components in a system. The information can provide insight into the operational characteristics and functionality of the components, as well as the process and system the components are being used within. This information may be used for preventative maintenance of the components, and to detect changes, issues, failures, events, problems, etc. in the process and system.
Need to check novelty before this filing date? Find Prior Art